This bachelor thesis deals with preparation of multicomponent Hf-B-C-N thin films. Six films divided into two series depending on the content of Hf in the target erosion area (15 % or 45 %) and the N2 fraction in the gas mixture, were studied. These films were deposi...

This thesis deals with high-power impulse magnetron sputtering (HiPIMS) of hafnium dioxide thin films. Depending on the average target power density in period with pulse length 200 s and duty 10 %, the properties of HfO2 thin films prepared by means of this method are inv...

This bachelor thesis deals with the preparation of HfO2 thin films using reactive high power impulse magnetron sputtering (HiPIMS) and measuring of their properties. The influence of a voltage pulse duration on parameters of magnetron discharge, deposition rate and properties of ...

This thesis deals with Y2O3 films deposited using magnetron sputtering and measurement of their properties. The examined films were formed under a partial pressure of oxygen of 0.6 Pa and 0.4 Pa. Mechanical and surface properties (hardness, thickness and roughness) were measured, as...

The presented bachelor?s thesis is at the beggining focused on using of plasma tech-nologies. Next, it explains basics of magnetron sputtering, its developement and use, with focus on High Power Impulse Magnetron Sputtering. Afterwards, it discusses ba-sic methods in modelling and simulation...

Hf-B-C films exhibit high hardness and low electrical resistivity. That makes them interesting for many different applications. The main aim of this study was to investigate the effects of deposition parameters and addition of silicon on compressive stress in films prepared by pulsed&#x...

This thesis deals with the issue of thin films deposited by reactive magnetron sputtering. Solves the effect of thickness of nanocomposite films Zr-Si-O on their mechanical properties. This work is mainly focused on the identification of all mechanical properties measured by microhardness&#x...

Presented thesis is first, at the beggining, focused on summation of the current state in the field of pulsed reactive sputtering of dielectric thin films. Basic terms and problems are presented, along with short description of SDTrimSP, a software used for simulation of particle&#...

This work investigates current problems of thin films based on Zr and B4C. It shows present achievements and opportunities of this field of study. In next part of the work are described methods of deposition of thin films especially pulsed magnetron deposition. Furthermore methods&...

This thesis is dedicated to the reactive magnetron sputtering Zr-Si-O films using ac pulse dual magnetron that operates in close magnetic field configuration. The partial pressures of reactive gas - oxygen on deposition rate, mechanical properties, structure and elemental composition of the&...

The subject of this thesis is the deposition of Ti-Si-O-N thin films using a pulsed DC reactive unbalanced magnetron sputtering. There were used two stacked Si-Ti targets with a different ratio of Si and Ti in the erosive zone for the deposition of samples from two s...

This thesis is aimed at reactive High-Power Impulsed Magnetron Sputtering (HiPIMS). Thin films were prepared in oxygen and argon atmosphere, at working pressure 2 Pa. A zirconium target of 100 mm in diameter with applied tantalum ring to erosion area was loaded by average powe...

The subject of this paper are measurements of the properties of thin Cr-Cu-O films, which were prepared by pulsed reactive magnetron sputtering with dual magnetron system. The influence of oxygen partial pressure on the properties of deposited Cr-Cu-O films was investigated. The films&#...

The bachelor thesis is focused on diagnostics of pulsed magnetron discharges during the deposition of thin films by means of optical emission spectroscopy. The first part of the thesis is dedicated to methods of magnetron sputtering, atomic and molecular spectra and equipment for o...