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Collection's Items (Sorted by Submit Date in Descending order): 1 to 20 of 27
Červená, Michaela , Zeman, Petr , Houška, Jiří , Šímová, Veronika , Procházka, Michal , Čerstvý, Radomír , Haviar, Stanislav , Vlček, Jaroslav
Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho addition

Hard and optically transparent amorphous Hf7B10Si32C2N44, Hf6B12Si29Y2C2N45 and Hf5B13Si25Ho3C2N48 films were prepared and examined for the oxidation resistance in air and thermal stability in inert gasses up to 1600 °C. A thermal evolution of their structure, hardness and optical properties was&...

Bárta, Tomáš , Vlček, Jaroslav , Houška, Jiří , Haviar, Stanislav , Čerstvý, Radomír , Szelwicka, Jolanta , Fahland, Matthias , Fahlteich, John
Pulsed Magnetron Sputtering of Strongly Thermochromic VO2-Based Coatings with a Transition Temperature of 22 °C onto Ultrathin Flexible Glass

The reversible semiconductor-to-metal transition of vanadium dioxide (VO2) makes VO2-based coatings a promising candidate for thermochromic smart windows, reducing the energy consumption of buildings. This paper deals with maximizing the application potential of these coatings in terms of their perfor...

Shen, Yi , Jiang, Jiechao , Zeman, Petr , Červená, Michaela , Šímová, Veronika , Vlček, Jaroslav , Meletis, Efstathios I.
Microstructure of High Temperature Oxidation Resistant Hf6B10Si31C2N50 and Hf7B10Si32C2N44 Films

High-temperature oxidation resistant amorphous Hf6B10Si31C2N50 and Hf7B10Si32C2N44 films were deposited by reactive pulsed dc magnetron sputtering. To investigate the oxidation mechanism, the films were annealed up to 1500 °C in air. The evolved microstructures were studied by X-ray diffraction and&#x...

Procházka, Michal , Vlček, Jaroslav , Houška, Jiří , Haviar, Stanislav , Čerstvý, Radomír , Veltruská, Kateřina
Multifunctional MoOx and MoOxNy films with 2.5 < x < 3.0 and y < 0.2 prepared using controlled reactive deep oscillation magnetron sputtering

Reactive deep oscillation magnetron sputtering with a pulsed reactive gas flow control and to-substrate reactive gas injection into the high-density plasma in front of the sputtered Mo target was used for a low-temperature (< 120 °C) preparation of MoOx and MoOxNy films with 2.5...

Kumar, Nirmal , Haviar, Stanislav , Rezek, Jiří , Baroch, Pavel , Zeman, Petr
Tuning Stoichiometry and Structure of Pd-WO3−x Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering

By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO3−x films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate ...

Kumar, Nirmal , Čapek, Jiří , Haviar, Stanislav
Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing

High-purity films consisting of copper tungstate (CuWO4) and sub-stoichiometric tungsten oxide (WO3-x) were prepared by reactive sputter deposition. An original two-step deposition process was applied for their synthesis. First, a tungsten oxide thin film was deposited by dc magnetron sputtering ...

Kolenatý, David , Vlček, Jaroslav , Bárta, Tomáš , Rezek, Jiří , Houška, Jiří , Haviar, Stanislav
High‑performance thermochromic VO2‑based coatings with a low transition temperature deposited on glass by a scalable technique

We report on high-performance thermochromic ZrO2/V0.982W0.018O2/ZrO2 coatings with a low transition temperature prepared on glass by a low-temperature scalable deposition technique. The V0.982W0.018O2 layers were deposited by a controlled high-power impulse magnetron sputtering of V target, combined w...

Zeman, Petr , Zuzjaková, Šárka , Čerstvý, Radomír , Houška, Jiří , Shen, Yi , Todt, Juraj , Jiang, Jiechao , Daniel, Rostislav , Keckes, Jozef , Meletis, Efstathios I. , Vlček, Jaroslav
Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic film

The high-temperature behavior of an electrically conductive, opaque and hard Hf7B23Si22C6N40 ceramic film with an amorphous structure was systematically investigated in air up to 1700 °C and inert gases up to 1600 °C. The film was prepared by reactive pulsed dc magnetron sputter de...

Choukourov, Andrei , Melnichuk, Iurii , Gordeev, Ivan , Nikitin, Daniil , Tafiichuk, Renata , Pleskunov, Pavel , Hanuš, Jan , Houška, Jiří , Kretková, Tereza , Dopita, Milan
Self-organization of vapor-deposited polyolefins at the solid/vacuum interface

Interactions between polyolefins and silicon substrates are investigated upon their physical vapor deposition under vacuum. Molecular dynamics simulations show that polyolefins unfold upon adsorption and that two macromolecules suffice to produce a stable nucleus. Supersharp probe AFM measurements reveal&#...

Batková, Šárka , Čapek, Jiří , Rezek, Jiří , Čerstvý, Radomír , Zeman, Petr
Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

CrN films were prepared using three different configurations of the HiPIMS discharge mode and the substrate holder potential. We investigate the effect of a positive pulse voltage (30–400 V) in bipolar HiPIMS on the crystal structure, microstructure and resulting mechanical properties of...

Belosludtsev, Alexander , Vlček, Jaroslav , Houška, Jiří , Haviar, Stanislav , Čerstvý, Radomír
Tunable composition and properties of Al–O–N films prepared by reactive deep oscillation magnetron sputtering

Houška, Jiří , Kozák, Tomáš
Distribution of O atoms on partially oxidized metal targets, and the consequences for reactive sputtering of individual metal oxides

Čapek, Jiří , Batková, Šárka , Matas, Martin , Kos, Šimon , Kozák, Tomáš , Haviar, Stanislav , Houška, Jiří , Schusser, Jakub , Minár, Jan , Dvořák, Filip , Zeman, Petr
Bixbyite-Ta2N2O film prepared by HiPIMS and postdeposition annealing: Structure and properties

Shen, Yi , Jiang, Jiechao , Zeman, Petr , Šímová, Veronika , Vlček, Jaroslav , Meletis, Efstathios I.
Microstructure evolution in amorphous Hf–B–Si–C–N high temperature resistant coatings after annealing to 1500 °C in air

Recently, amorphous Hf–B–Si–C–N coatings found to demonstrate superior high-temperature oxidation resistance. The microstructure evolution of two coatings, Hf7B23Si22C6N40 and Hf6B21Si19C4N47, annealed to 1500 °C in air is investigated to understand their high oxidation resistance. The annealed coatings develop...

Mareš, Pavel , Vlček, Jaroslav , Houška, Jiří , Kohout, Jiří , Čapek, Jiří
Effect of energetic particles on pulsed magnetron sputtering of hard nanocrystalline MBCN (M = Ti, Zr, Hf) films with high electrical conductivity

Nanocrystalline MBCN (M = Ti, Zr, Hf) films were deposited onto Si substrates using pulsed magnetron co-sputtering of a single B4C-M target. The substrate temperature was adjusted to 450 °C during the depositions on the substrates at a floating potential. The total pressure of ...

Musil, Jindřich , Čiperová, Zuzana , Čerstvý, Radomír , Haviar, Stanislav
Flexible hard (Zr, Si) alloy films prepared by magnetron sputtering

The article reports on the investigation of mechanical properties of Si-rich (Zr, Si) alloy films deposited by magnetron sputtering. The main aim of this investigation is to develop flexible hard (Zr, Si) alloy films with enhanced resistance to cracking. The (Zr, Si) films were...

Houška, Jiří
Maximum N content in a-CNx by ab-initio simulations

Structures of amorphous CNx materials are predicted by extensive ab-initio molecular-dynamics simulations (more than 800 trajectories) in a wide range of compositions and densities. The main attention is paid to the formation of N2 molecules, with the aim to predict and explain the ...

Musil, Jindřich , Jaroš, Martin , Kos, Šimon
Superhard metallic coatings

The letter reports on the surface hardening of bulk soft metal materials by protective coatings made of the same metal as bulk but with up to 6 times higher hardness than that of the bulk material. This surface hardening is demonstrated by covering of the Ti substrat...

Rezek, Jiří , Novák, Petr , Houška, Jiří , Pajdarová, Andrea Dagmar , Kozák, Tomáš
High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperature

Reactive high-power impulse magnetron sputtering was used for high-rate (deposition rate of 60 nm/min) deposition of conductive (resistivity of 0.003 Ω·cm) and optically transparent (extinction coefficient at the wavelength of 550 nm of 0.01) ZnO:Al thin films at ambient temperature (<&#x...

Musil, Jindřich , Kos, Šimon , Jaroš, Martin , Čerstvý, Radomír , Haviar, Stanislav , Zenkin, Sergei , Čiperová, Zuzana
Coating of overstoichiometric transition metal nitrides (TMNx (x > 1)) by magnetron sputtering

This article reports on the formation of strongly overstoichiometric ZrNx>1 and Ti(Al, V)Nx>1 coatings by reactive magnetron sputtering. Problems in the formation of overstoichiometric coatings and possible ways to form strongly overstoichiometric TMNx>1 nitride coatings up to TMNx=2 dinitride...

Collection's Items (Sorted by Submit Date in Descending order): 1 to 20 of 27