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dc.contributor.authorFiala, Pavel-
dc.date.accessioned2012-11-08T09:55:08Z
dc.date.available2012-11-08T09:55:08Z
dc.date.issued2011-12-30
dc.identifier.citationElectroscope. 2011, č. 3.cs
dc.identifier.issn1802-4564
dc.identifier.urihttp://147.228.94.30/images/PDF/Rocnik2011/Cislo3_2011/r5c4c7.pdf
dc.identifier.urihttp://hdl.handle.net/11025/619
dc.description.abstractThis paper presents a research focused on advanced screen printing technique development. In the paper it is shown that it is possible to realize structures with line width below 50 μm at the pitch below 100 μm and ultra-thin film deposition well below 1 μm by advanced screen printing technique. Screen printing quality and its resolution relate to many factors such as the type of mesh, emulsion, paste, the thickness of emulsion and squeegee speed and its hardness. These printing parameters and many others were analyzed in the presented research project.en
dc.format5 s.cs
dc.format.mimetypeapplication/pdf
dc.language.isoenen
dc.publisherZápadočeská univerzita v Plzni, Fakulta elektrotechnickács
dc.relation.ispartofseriesElectroscopecs
dc.rightsCopyright © 2007-2010 Electroscope. All Rights Reserved.en
dc.subjectdepozice sítotiskemcs
dc.subjectultrajemnné vzorycs
dc.titleTechnical challenges of screen printing deposition for ultra-fine patternsen
dc.typečlánekcs
dc.typearticleen
dc.rights.accessopenAccessen
dc.type.versionpublishedVersionen
dc.subject.translatedscreen printing depositionen
dc.subject.translatedultra-fine patternsen
dc.type.statusPeer-revieweden
Appears in Collections:Číslo 3 (2011)
Články / Articles (RICE)
Číslo 3 (2011)

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