Browsing by Author Houška, Jiří

Jump to: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
or enter first few letters:  
Showing results 1 to 18 of 18
Issue DateTitleAuthor(s)
2020Bixbyite-Ta2N2O film prepared by HiPIMS and postdeposition annealing: Structure and propertiesČapek, Jiří; Batková, Šárka; Matas, Martin; Kos, Šimon; Kozák, Tomáš; Haviar, Stanislav; Houška, Jiří; Schusser, Jakub; Minár, Jan; Dvořák, Filip; Zeman, Petr
2021Dependence of characteristics of Hf(M)SiBCN (M = Y, Ho, Ta, Mo) thin films on the M choice: Ab-initio and experimental studyMatas, Martin; Procházka, Michal; Vlček, Jaroslav; Houška, Jiří
2020Distribution of O atoms on partially oxidized metal targets, and the consequences for reactive sputtering of individual metal oxidesHouška, Jiří; Kozák, Tomáš
2019Effect of energetic particles on pulsed magnetron sputtering of hard nanocrystalline MBCN (M = Ti, Zr, Hf) films with high electrical conductivityMareš, Pavel; Vlček, Jaroslav; Houška, Jiří; Kohout, Jiří; Čapek, Jiří
2021Enhancement of high-temperature oxidation resistance and thermal stability of hard and optically transparent Hf–B–Si–C–N films by Y or Ho additionČervená, Michaela; Zeman, Petr; Houška, Jiří; Šímová, Veronika; Procházka, Michal; Čerstvý, Radomír; Haviar, Stanislav; Vlček, Jaroslav
2020Extraordinary high-temperature behavior of electrically conductive Hf7B23Si22C6N40 ceramic filmZeman, Petr; Zuzjaková, Šárka; Čerstvý, Radomír; Houška, Jiří; Shen, Yi; Todt, Juraj; Jiang, Jiechao; Daniel, Rostislav; Keckes, Jozef; Meletis, Efstathios I.; Vlček, Jaroslav
2019High-rate reactive high-power impulse magnetron sputtering of transparent conductive Al-doped ZnO thin films prepared at ambient temperatureRezek, Jiří; Novák, Petr; Houška, Jiří; Pajdarová, Andrea Dagmar; Kozák, Tomáš
2020High‑performance thermochromic VO2‑based coatings with a low transition temperature deposited on glass by a scalable techniqueKolenatý, David; Vlček, Jaroslav; Bárta, Tomáš; Rezek, Jiří; Houška, Jiří; Haviar, Stanislav
2019Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMSVlček, Jaroslav; Kolenatý, David; Kozák, Tomáš; Houška, Jiří; Čapek, Jiří; Kos, Šimon
2020Maximum achievable N content in atom-by-atom growth of amorphous Si‒C‒NHouška, Jiří
2019Maximum N content in a-CNx by ab-initio simulationsHouška, Jiří
2021Multifunctional MoOx and MoOxNy films with 2.5 < x < 3.0 and y < 0.2 prepared using controlled reactive deep oscillation magnetron sputteringProcházka, Michal; Vlček, Jaroslav; Houška, Jiří; Haviar, Stanislav; Čerstvý, Radomír; Veltruská, Kateřina
2020Pulsed Magnetron Sputtering of Strongly Thermochromic VO2-Based Coatings with a Transition Temperature of 22 °C onto Ultrathin Flexible GlassBárta, Tomáš; Vlček, Jaroslav; Houška, Jiří; Haviar, Stanislav; Čerstvý, Radomír; Szelwicka, Jolanta; Fahland, Matthias; Fahlteich, John
2016Reactive high-power impulse magnetron sputtering of thermochromic VO2 films on silicon substrate at low deposition temperaturesKolenatý, David; Houška, Jiří; Rezek, Jiří; Čerstvý, Radomír; Vlček, Jaroslav
2020Self-organization of vapor-deposited polyolefins at the solid/vacuum interfaceChoukourov, Andrei; Melnichuk, Iurii; Gordeev, Ivan; Nikitin, Daniil; Tafiichuk, Renata; Pleskunov, Pavel; Hanuš, Jan; Houška, Jiří; Kretková, Tereza; Dopita, Milan
2019Significant improvement of the performance of ZrO2/V1–xWxO2/ZrO2 thermochromic coatings by utilizing a second-order interferenceHouška, Jiří; Kolenatý, David; Vlček, Jaroslav; Bárta, Tomáš; Rezek, Jiří; Čerstvý, Radomír
2019Tribological properties and oxidation resistance of tungsten and tungsten nitride films at temperatures up to 500 °CJavdošňák, Daniel; Musil, Jindřich; Soukup, Zbyněk; Haviar, Stanislav; Čerstvý, Radomír; Houška, Jiří
2020Tunable composition and properties of Al–O–N films prepared by reactive deep oscillation magnetron sputteringBelosludtsev, Alexander; Vlček, Jaroslav; Houška, Jiří; Haviar, Stanislav; Čerstvý, Radomír