Title: Effect of hydrogen on sputtering discharge and properties of TiO2 films
Authors: Musil, Jindřich
Ondok, Václav
Citation: XXVIII International conference on phenomena in ionized gases: July 15-20, 2007, Prague, Czech Republic: proceedings. Praha: Institute of Plasma Physics AS CR, 2007, p. 675-678.
Issue Date: 2007
Publisher: Institute of Plasma Physics AS CR
Document type: konferenční příspěvek
URI: http://icpig2007.ipp.cas.cz/files/download/cd-cko/ICPIG2007/pdf/2P13-14.pdf
ISBN: 978-80-87026-01-4
Keywords: tenké vrstvy;reaktivní magnetronové naprašování;TiO2 vrtvy;hydrofilicita;optické vlastnosti
Keywords in different language: thin films;reactive magnetron sputtering;TiO2 films;hydrofilicity;optical properties
Abstract: This article reports on the effect of hydrogen addition into the Ar+O2 discharge mixture on the dc reactive magnetron sputtering process and on the structure of sputtered TiO2 films. The hydrogen plays a key role in reactive sputtering of electrically insulating oxides from metallic targets because it fully eliminates arcing on the sputtered target. The hydrogen also strongly influences the dependence of the partial pressure of oxygen pO2 vs. flow rate of oxygen φO2. Changes in the pO2=f(φO2) dependence caused by the addition of H2 into the Ar+O2 mixture are explained. Special attention is devoted to correlations between deposition parameters, structure, phase composition, optical properties and hydrophilic activity of TiOx≈2 films. It is shown that the presence of H2 in the Ar+O2 mixture does not prevent from the formation of superhydrophilic TiOx≈2 films.
Rights: © Jindřich Musil, Václav Ondok
Appears in Collections:Konferenční příspěvky / Conference Papers (KFY)

Files in This Item:
File Description SizeFormat 
2P13-14.pdf589,07 kBAdobe PDFView/Open

Please use this identifier to cite or link to this item: http://hdl.handle.net/11025/1437

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.