Katedra fyziky / Department of Physics


Recent Submissions

Kumar, Nirmal , Haviar, Stanislav , Rezek, Jiří , Baroch, Pavel , Zeman, Petr
Tuning Stoichiometry and Structure of Pd-WO3−x Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering

By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO3−x films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate ...

Procházka, Michal
Multikomponentní nanokompozitní vrstvy připravené pulzním magnetronovým naprašováním

This thesis reports on study of four multicomponent nanostructure materials prepared by pulsed magnetron deposition. In all four cases, the main aim was to prepare and characterize promising materials with high potential in various applications. The thesis is divided into seven chapters.�...

Moskal, Denys

Laser surface texturing is one of the methods used for controllable surface structuring and acquisition of specific surface physical properties. This Ph.D. dissertation is focused on the characterization of the thermo-physical processes in ultrashort pulse laser surface texturing (LST) and develo...

Kumar, Nirmal , Čapek, Jiří , Haviar, Stanislav
Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing

High-purity films consisting of copper tungstate (CuWO4) and sub-stoichiometric tungsten oxide (WO3-x) were prepared by reactive sputter deposition. An original two-step deposition process was applied for their synthesis. First, a tungsten oxide thin film was deposited by dc magnetron sputtering ...

Kolenatý, David , Vlček, Jaroslav , Bárta, Tomáš , Rezek, Jiří , Houška, Jiří , Haviar, Stanislav
High‑performance thermochromic VO2‑based coatings with a low transition temperature deposited on glass by a scalable technique

We report on high-performance thermochromic ZrO2/V0.982W0.018O2/ZrO2 coatings with a low transition temperature prepared on glass by a low-temperature scalable deposition technique. The V0.982W0.018O2 layers were deposited by a controlled high-power impulse magnetron sputtering of V target, combined w...