Interakce člověka a stroje / Man Machine Interaction (MMI)


Recent Submissions

Bellemore, M.
Experience with the Intramedullary Skeletal Kinetic Distractor for Limb Lengthening (ISKD Nail)

Jaroš, Martin , Musil, Jindřich , Haviar, Stanislav
Interrelationships among macrostress, microstructure and mechanical behavior of sputtered hard Ti(Al,V)N films

The article reports on the influence of a compressive macrostress in the Ti(Al,V)N films on their mechanical properties, structure, microstructure, and resistance to cracking. The macrostress is controlled by the energy Ebi delivered into the growing film by bombarding ions. The Ti(Al,V)N&#x...

Vlček, Jaroslav , Kolenatý, David , Kozák, Tomáš , Houška, Jiří , Čapek, Jiří , Kos, Šimon
Ion-flux characteristics during low-temperature (300 °C) deposition of thermochromic VO2 films using controlled reactive HiPIMS

The ion-flux characteristics at a substrate position and the corresponding discharge characteristics were investigated during controlled low-temperature (300 °C) reactive HiPIMS depositions of thermochromic VO2 films onto conventional soda-lime glass substrates without any substrate bias voltage and without...

Haviar, Stanislav , Čapek, Jiří , Batková, Šárka , Kumar, Nirmal , Dvořák, Filip , Duchoň, Tomáš , Fialová, Markéta , Zeman, Petr
Hydrogen gas sensing properties of WO3 sputter-deposited thin films enhanced by on-top deposited CuO nanoclusters

Magnetron-based gas aggregation cluster source (GAS) was used to prepare high-purity CuO (cupric oxide) nanoclusters on top of sputter-deposited thin film of tungsten trioxide (WO3). The material was assembled as a conductometric hydrogen gas sensor and its response was tested and evaluated....

Zítek, Michal , Zeman, Petr , Kotrlová, Michaela , Čerstvý, Radomír
Impact of Al or Si addition on properties and oxidation resistance of magnetron sputtered Zr–Hf–Al/Si–Cu metallic glasses

Amorphous quaternary Zr–Hf–Al/Si–Cu thin-film metallic alloys were prepared by non-reactive magnetron co-sputtering using four unbalanced magnetrons equipped with Zr, Hf, Al or Si, and Cu targets. The Zr, Hf and Al or Si targets were sputtered in dc regimes while the Cu target ...