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dc.contributor.authorMontrucchio, B.
dc.contributor.authorLamberti, F.
dc.contributor.authorSanna, A.
dc.contributor.authorMontuschi, P.
dc.contributor.editorSkala, Václav
dc.identifier.citationWSCG '2002: Short Communication Papers: The 10-th International Conference in Central Europe on Computer Graphics, Visualization and Computer Vision 2002, 4.-8. February 2002 Plzeň: Conference proceedings, p. 83-90.en
dc.identifier.isbn1213-6972 (hardcopy)
dc.identifier.isbn1213-6980 (CD-ROM)
dc.identifier.isbn1213-6964 (on-line)
dc.description.abstractMany image processing tasks depend on contrast measures, which can be used to compare and improve contrast enhancement algorithms. Contrast definitions are not always suitable for all situations. In particular an isotropic local contrast measure, that produces a flat response to sinusoidal gratings, can be difficult to obtain. In this paper we review the main existing contrast measures, and propose a new approach, denoted as Circular Mask Metric (CMM). It is based on band-pass filters and circular mask based local contrast computations. This approach has been applied on different test images and with three contrast enhancement methods, in order to show its potentialities for contrast enhancement algorithm testing and improving.en
dc.format8 s.cs
dc.publisherUNION Agencyen
dc.relation.ispartofseriesWSCG '2002: Short Communication Papersen
dc.rights© UNION Agencycs
dc.subjectizotropní lokální kontrastcs
dc.subjectkruhová maskacs
dc.subjectzpracování obrazucs
dc.titleMeasuring isotropic local contrast: a circular mask based approachen
dc.typekonferenční příspěvekcs
dc.subject.translatedisotropic local contrasten
dc.subject.translatedcircular masken
dc.subject.translatedimage processingen
Appears in Collections:WSCG '2002: Short Communication Papers

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