Title: High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2 films: the effect of repetition frequency
Other Titles: Vliv opakovací frekvence na vlastnosti vysokorychlostně naprašovaných fotokatalytických vrstev TiO2 připravených při nízké teplotě
Authors: Musil, Jindřich
Heřman, David
Šícha, Jan
Strýhal, Zdeněk
Pavlík, Jaroslav
Citation: Nanoscale Research Letters. 2007, vol. 2, is. 3, p. 123-129.
Issue Date: 2007
Publisher: Springer
Document type: článek
URI: doi:10.1007/s11671-007-9042-z
ISSN: 1556-276X
Keywords: tenké vrstvy;hydrofilicita;depoziční rychlost;duální magnetron;polykarbonát
Keywords in different language: thin films;TiO2;hydrophilicity;deposition rate;dual magnetron;polycarbonate
Abstract: The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2thin films using dc dual magnetron (DM) sputtering in Ar + O2mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature Tsurfmeasured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency frwas investigated in detail. It was found that the increase of frfrom 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate aDof sputtered TiO2films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO2films can be sputtered on unheated glass substrates at aD = 80 nm/min, Tsurf < 180 °C when high value of fr = 350 kHz was used. Properties of a thin hydrophilic TiO2film deposited on a polycarbonate substrate are given.
Rights: © Jindřich Musil, Zdeněk Strýhal, Jaroslav Pavlík, Jan Šícha, David Heřman
Appears in Collections:Články / Articles (KFY)

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