Katedra fyziky / Department of Physics

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Poslední příspěvky

Kaufman, Michal
Vysokovýkonová pulzní reaktivní magnetronová depozice termochromických vrstev na bázi VO2

This thesis is focused on the reactive deposition of VO2 thermochromic thin films using High-Power Impulse Magnetron Sputtering (HiPIMS). It describes the unique properties of this oxide, the method of its synthesis using the Reactive Gas Flow Control (RGFC) and the possibility of ...

Lerchová, Tereza
Parametrické modelování pulzního vysokovýkonového magnetronového výboje pro depozici vrstev

At the beginning, the presented bachelor's thesis is focused on the plasma medium and plasma technologies. Next, it describes the current state in the field of modelling of plasma discharges during the deposition of thin films. This chapter also contains a brief description of&...

Matas, Martin
Modelování vlivu kinetické energie atomů kovu a kyslíku na růst krystalických oxidů

Classical molecular dynamics using the Buckingham empirical potential was employed to optimize some technical parameters of the simulation procedure, and then to simulate the growth of Al2O3 thin films on alpha-Al2O3 (0001) substrate at 300 K. Crystallinity of the films obtained was inv...

Benešová, Martina
Počítačová simulace procesů na terči během reaktivního magnetronového naprašování

This thesis studies processes on a target during reactive magnetron sputtering. The theory of reactive magnetron sputtering and the methodology of simulations of atomic scale processes on the target are summarized and also SDTrimSP program is described in the first part of the thes...

Tichý, Michal , Tichý, Michal , Vlček Jaroslav, Prof. RNDr. CSc.
Vysokovýkonová pulzní reaktivní magnetronová depozice vrstev VO2 na skle

This thesis deals with reactive High-Power Impulse Magnetron Sputtering (HiPIMS) of vanadium dioxide thin films on glass substrates. The aim is to create VO2 thermochromic thin films through controlled HiPIMS deposition and investigate the influence of deposition parameters on discharge character...