Bakalářské práce (KFY) / Bachelor´s works (DP) Domovská stránka kolekce Zobrazit statistiky

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Záznamy kolekce (řazeno podle Datum zaslání v sestupně pořadí): 1 až 20 z 21
Kaufman, Michal
Vysokovýkonová pulzní reaktivní magnetronová depozice termochromických vrstev na bázi VO2

This thesis is focused on the reactive deposition of VO2 thermochromic thin films using High-Power Impulse Magnetron Sputtering (HiPIMS). It describes the unique properties of this oxide, the method of its synthesis using the Reactive Gas Flow Control (RGFC) and the possibility of ...

Lerchová, Tereza
Parametrické modelování pulzního vysokovýkonového magnetronového výboje pro depozici vrstev

At the beginning, the presented bachelor's thesis is focused on the plasma medium and plasma technologies. Next, it describes the current state in the field of modelling of plasma discharges during the deposition of thin films. This chapter also contains a brief description of&...

Matas, Martin
Modelování vlivu kinetické energie atomů kovu a kyslíku na růst krystalických oxidů

Classical molecular dynamics using the Buckingham empirical potential was employed to optimize some technical parameters of the simulation procedure, and then to simulate the growth of Al2O3 thin films on alpha-Al2O3 (0001) substrate at 300 K. Crystallinity of the films obtained was inv...

Benešová, Martina
Počítačová simulace procesů na terči během reaktivního magnetronového naprašování

This thesis studies processes on a target during reactive magnetron sputtering. The theory of reactive magnetron sputtering and the methodology of simulations of atomic scale processes on the target are summarized and also SDTrimSP program is described in the first part of the thes...

Kubásek, Tomáš
Multikomponentní keramické vrstvy připravené pulzním magnetronovým naprašováním

This thesis deals with hard multicomponent thin films M-B-C-N (M = Ti, Zr, Hf) prepared by pulsed magnetron sputtering. Four films in total were created and their elemental and structural compositions, mechanical properties and electrical resistivity were measured. The focus of t...

Pokorná, Markéta
Depozice (Ti,Al,V)N vrstev a měření jejich koeficientu tření a mechanických vlastností

This paper reports on DC magnetron sputtered Ti,Al,V and (Ti,Al,V)N coatings, their structural, mechanical and tribological properties.It was found that nitride coating shows enhanced mechanical and tribological properties.It was not possible to determine tribological parameters of Ti,Al,V because the ...

Čiperová, Zuzana
Reaktivní magnetronové naprašování vrstev Ti-Ni-N

Subject of the thesis was reactive magnetron sputtering of three Ti-Ni-N thin films. The work focuses on the influence of partial pressure of nitrogen on the deposition rate, the roughness and the mechanical properties of deposited thin films. The thin films were prepared in&...

Kotrlová, Michaela
Pulzní magnetronové naprašování multikomponentních vrstev a měření jejich elektrické vodivosti a mechanických vlastností

This bachelor thesis deals with preparation of multicomponent Hf-B-C-N thin films. Six films divided into two series depending on the content of Hf in the target erosion area (15 % or 45 %) and the N2 fraction in the gas mixture, were studied. These films were deposi...

Hruška, Jan
Vliv průměrné výkonové hustoty na terči během depozice vrstev HfO2 pomocí reaktivního vysoko-výkonového pulzního magnetronového naprašování

This thesis deals with high-power impulse magnetron sputtering (HiPIMS) of hafnium dioxide thin films. Depending on the average target power density in period with pulse length 200 s and duty 10 %, the properties of HfO2 thin films prepared by means of this method are inv...

Tichý, Michal
Vliv délky napěťového pulzu na reaktivní vysokovýkonovou pulzní magnetronovou depozici vrstev HfO2

This bachelor thesis deals with the preparation of HfO2 thin films using reactive high power impulse magnetron sputtering (HiPIMS) and measuring of their properties. The influence of a voltage pulse duration on parameters of magnetron discharge, deposition rate and properties of ...

Batková, Šárka
Depozice vrstev Y2O3 a měření jejich kontaktního úhlu a mechanických vlastností

This thesis deals with Y2O3 films deposited using magnetron sputtering and measurement of their properties. The examined films were formed under a partial pressure of oxygen of 0.6 Pa and 0.4 Pa. Mechanical and surface properties (hardness, thickness and roughness) were measured, as...

Procházka, Michal
Pulzní magnetronová depozice nových nanostrukturních multikomponentních vrstev

Hf-B-C films exhibit high hardness and low electrical resistivity. That makes them interesting for many different applications. The main aim of this study was to investigate the effects of deposition parameters and addition of silicon on compressive stress in films prepared by pulsed&#x...

Krejčová, Milada
Nestacionární model pro vysokovýkonové pulzní magnetronové rozprašování kovů

The presented bachelor?s thesis is at the beggining focused on using of plasma tech-nologies. Next, it explains basics of magnetron sputtering, its developement and use, with focus on High Power Impulse Magnetron Sputtering. Afterwards, it discusses ba-sic methods in modelling and simulation...

Javdošňák, Daniel
Vliv tloušťky nanokompozitních vrstev Si-Zr-O na jejich mechanické vlastnosti

This thesis deals with the issue of thin films deposited by reactive magnetron sputtering. Solves the effect of thickness of nanocomposite films Zr-Si-O on their mechanical properties. This work is mainly focused on the identification of all mechanical properties measured by microhardness&#x...

Šula, Michal
Fenomenologický model pro vysokovýkonovou pulzní reaktivní magnetronovou depozici dielektrických vrstev

Presented thesis is first, at the beggining, focused on summation of the current state in the field of pulsed reactive sputtering of dielectric thin films. Basic terms and problems are presented, along with short description of SDTrimSP, a software used for simulation of particle&#...

Vytisk, Tomáš
Pulzní magnetronová depozice tenkovrstvých materiálů ze systému Zr-Si-B-C-N

This work investigates current problems of thin films based on Zr and B4C. It shows present achievements and opportunities of this field of study. In next part of the work are described methods of deposition of thin films especially pulsed magnetron deposition. Furthermore methods&...

Zítek, Michal
Naprašování nanokompozitních vrstev Ti-Si-O-N a jejich vlastnosti

The subject of this thesis is the deposition of Ti-Si-O-N thin films using a pulsed DC reactive unbalanced magnetron sputtering. There were used two stacked Si-Ti targets with a different ratio of Si and Ti in the erosive zone for the deposition of samples from two s...

Vonásek, Martin
Vysokorychlostní naprašování vrstev SiZrO

This thesis is dedicated to the reactive magnetron sputtering Zr-Si-O films using ac pulse dual magnetron that operates in close magnetic field configuration. The partial pressures of reactive gas - oxygen on deposition rate, mechanical properties, structure and elemental composition of the&...

Kolenatý, David
Reaktivní depozice vrstev pomocí vysokovýkonového pulzního magnetronového zdroje

This thesis is aimed at reactive High-Power Impulsed Magnetron Sputtering (HiPIMS). Thin films were prepared in oxygen and argon atmosphere, at working pressure 2 Pa. A zirconium target of 100 mm in diameter with applied tantalum ring to erosion area was loaded by average powe...

Jaroš, Martin
Reaktivní magnetronové naprašování vrstev CrCuO

The subject of this paper are measurements of the properties of thin Cr-Cu-O films, which were prepared by pulsed reactive magnetron sputtering with dual magnetron system. The influence of oxygen partial pressure on the properties of deposited Cr-Cu-O films was investigated. The films&#...

Záznamy kolekce (řazeno podle Datum zaslání v sestupně pořadí): 1 až 20 z 21