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Collection's Items (Sorted by Submit Date in Descending order): 1 to 20 of 25
Čurda, Pavel
Vysokovýkonová pulzní reaktivní magnetronová depozice termochromických vrstev na bázi VO2

This thesis is focused on reactive deposition of V1-xWxO2 thin films using High-Power Impulse Magnetron Sputtering and their thermochromic properties. Shortages of current VO2 thin films and posibilities of future solutions are given. Possible solutions are the use of anti-reflexive coating ...

Dvořák, Tomáš
Studium vlastností tenkých vrstev na bázi multiprvkových kovových skel

This bachelor thesis is focused on the study of properties of thin films based on multi-component metallic glasses. The influence of Al and Si doping in two series of ZrHfAl/SiCu layers on the phase composition, thermal, mechanical and surface properties and on electrical resi...

Macháňová, Pavla
Předpověď struktur multiprvkových kovových vrstev vytvářených atom po atomu pomocí klasické molekulární dynamiky

This paper presents modeling of thin layer CuZr using classical molecular dynamics. Interactions among atoms were described with empirical potentials. The simulations were done using the LAMMPS program. Single atoms Cu and Zr were deposited on crystalline Cu substrate. I focused ...

Bělohoubek, Marek
Simulace transportu rozprášených atomů v magnetronových výbojích

The main subject of this thesis is a simulation of transport of neutral particles in magnetron discharges at low pressure. It focuses on processes in the specified geometry and describes interaction of argon process gas with the sputtered metal. The theory of magnetron sputtering&#...

Kaufman, Michal
Vysokovýkonová pulzní reaktivní magnetronová depozice termochromických vrstev na bázi VO2

This thesis is focused on the reactive deposition of VO2 thermochromic thin films using High-Power Impulse Magnetron Sputtering (HiPIMS). It describes the unique properties of this oxide, the method of its synthesis using the Reactive Gas Flow Control (RGFC) and the possibility of ...

Lerchová, Tereza
Parametrické modelování pulzního vysokovýkonového magnetronového výboje pro depozici vrstev

At the beginning, the presented bachelor's thesis is focused on the plasma medium and plasma technologies. Next, it describes the current state in the field of modelling of plasma discharges during the deposition of thin films. This chapter also contains a brief description of&...

Matas, Martin
Modelování vlivu kinetické energie atomů kovu a kyslíku na růst krystalických oxidů

Classical molecular dynamics using the Buckingham empirical potential was employed to optimize some technical parameters of the simulation procedure, and then to simulate the growth of Al2O3 thin films on alpha-Al2O3 (0001) substrate at 300 K. Crystallinity of the films obtained was inv...

Benešová, Martina
Počítačová simulace procesů na terči během reaktivního magnetronového naprašování

This thesis studies processes on a target during reactive magnetron sputtering. The theory of reactive magnetron sputtering and the methodology of simulations of atomic scale processes on the target are summarized and also SDTrimSP program is described in the first part of the thes...

Kubásek, Tomáš
Multikomponentní keramické vrstvy připravené pulzním magnetronovým naprašováním

This thesis deals with hard multicomponent thin films M-B-C-N (M = Ti, Zr, Hf) prepared by pulsed magnetron sputtering. Four films in total were created and their elemental and structural compositions, mechanical properties and electrical resistivity were measured. The focus of this&#x...

Čiperová, Zuzana
Reaktivní magnetronové naprašování vrstev Ti-Ni-N

Subject of the thesis was reactive magnetron sputtering of three Ti-Ni-N thin films. The work focuses on the influence of partial pressure of nitrogen on the deposition rate, the roughness and the mechanical properties of deposited thin films. The thin films were prepared in&...

Pokorná, Markéta
Depozice (Ti,Al,V)N vrstev a měření jejich koeficientu tření a mechanických vlastností

This paper reports on DC magnetron sputtered Ti,Al,V and (Ti,Al,V)N coatings, their structural, mechanical and tribological properties.It was found that nitride coating shows enhanced mechanical and tribological properties.It was not possible to determine tribological parameters of Ti,Al,V because the ...

Kotrlová, Michaela
Pulzní magnetronové naprašování multikomponentních vrstev a měření jejich elektrické vodivosti a mechanických vlastností

This bachelor thesis deals with preparation of multicomponent Hf-B-C-N thin films. Six films divided into two series depending on the content of Hf in the target erosion area (15 % or 45 %) and the N2 fraction in the gas mixture, were studied. These films were deposi...

Hruška, Jan
Vliv průměrné výkonové hustoty na terči během depozice vrstev HfO2 pomocí reaktivního vysoko-výkonového pulzního magnetronového naprašování

This thesis deals with high-power impulse magnetron sputtering (HiPIMS) of hafnium dioxide thin films. Depending on the average target power density in period with pulse length 200 s and duty 10 %, the properties of HfO2 thin films prepared by means of this method are inv...

Tichý, Michal
Vliv délky napěťového pulzu na reaktivní vysokovýkonovou pulzní magnetronovou depozici vrstev HfO2

This bachelor thesis deals with the preparation of HfO2 thin films using reactive high power impulse magnetron sputtering (HiPIMS) and measuring of their properties. The influence of a voltage pulse duration on parameters of magnetron discharge, deposition rate and properties of ...

Batková, Šárka
Depozice vrstev Y2O3 a měření jejich kontaktního úhlu a mechanických vlastností

This thesis deals with Y2O3 films deposited using magnetron sputtering and measurement of their properties. The examined films were formed under a partial pressure of oxygen of 0.6 Pa and 0.4 Pa. Mechanical and surface properties (hardness, thickness and roughness) were measured, as...

Procházka, Michal
Pulzní magnetronová depozice nových nanostrukturních multikomponentních vrstev

Hf-B-C films exhibit high hardness and low electrical resistivity. That makes them interesting for many different applications. The main aim of this study was to investigate the effects of deposition parameters and addition of silicon on compressive stress in films prepared by pulsed&#x...

Krejčová, Milada
Nestacionární model pro vysokovýkonové pulzní magnetronové rozprašování kovů

The presented bachelor?s thesis is at the beggining focused on using of plasma tech-nologies. Next, it explains basics of magnetron sputtering, its developement and use, with focus on High Power Impulse Magnetron Sputtering. Afterwards, it discusses ba-sic methods in modelling and simulation...

Javdošňák, Daniel
Vliv tloušťky nanokompozitních vrstev Si-Zr-O na jejich mechanické vlastnosti

This thesis deals with the issue of thin films deposited by reactive magnetron sputtering. Solves the effect of thickness of nanocomposite films Zr-Si-O on their mechanical properties. This work is mainly focused on the identification of all mechanical properties measured by microhardness&#x...

Šula, Michal
Fenomenologický model pro vysokovýkonovou pulzní reaktivní magnetronovou depozici dielektrických vrstev

Presented thesis is first, at the beggining, focused on summation of the current state in the field of pulsed reactive sputtering of dielectric thin films. Basic terms and problems are presented, along with short description of SDTrimSP, a software used for simulation of particle&#...

Vytisk, Tomáš
Pulzní magnetronová depozice tenkovrstvých materiálů ze systému Zr-Si-B-C-N

This work investigates current problems of thin films based on Zr and B4C. It shows present achievements and opportunities of this field of study. In next part of the work are described methods of deposition of thin films especially pulsed magnetron deposition. Furthermore methods&...

Collection's Items (Sorted by Submit Date in Descending order): 1 to 20 of 25